NanoBionics Fabrication Facility

The NanoBionics Fabrication facility, housed in IMS, is a 1,000-square-foot class 1000 'clean room’ with a vide range of facilities for fabricating, testing and processing micro/opto and biomedical devices. The NanoBionic Fabrication facility includes the following state of the art facilities.

Suss MicroTech MA BA 6 Microlithograph Station

A MA6BA6 SUSS Microtec Stepper capable to process up to 6" wafers with complementary spinning, baking, etching and developing stations. The facility can achieve resolution as low as 0.25 microns.

PVA Tepla Microwave Plasma Asher

This microwave plasma provides uniform etching, surface cleaning and photoresist stripping. It is capable of removing thick organic layers (like SU8 for MEMs and microfluidic applications) as well as SiO2, polysilicon and SiN layers. The unit has a integrated software and a computer to save process parameters and conditions.

Thermal Evaporators and Sputtering Units

Two thermal evaporators with multiple sources and thickness monitors are dedicated for metals (Au, Ag, Al, Pd).

One evaporator has a custom made sources and thickness monitors capable of evaporating both metals and sublimable organics).

Asputtering evaporator is dedicated exclusively for deposition of dielectrics.

Film Thickness and Characterization Facilities

A 300-1,000 nm spectroscopic ellipsometer capable to decipher film thicknesses with Å resolution and a Dektak 150 Surface Profilometer for coarse thickness measurements, complement each other for achieving accurate results.

A Karl Suss PM8 Probe Station with 10x, 20x, and 50x parafocal objectives and a Motic 2300 Digital Camera and a HP 4155 semiconductor parameter analyzer and integrated spectrophotometer provides ability to probe sub nm features and devices.

Wet and Dry Processing Stations

Two wet laminar flow hoods with complimentary spinners, wash, rinse and drying and bake stations provide ability to fabricate devices in large scale.

A additional dry laminar flow hood for sample preparation complements the wet processing laminar flow hood.

The facility also includes facilites outside the clean room. Some of them include a HP E5100A quartz crystal microbalance impedance spectroscopy, a state of the art tunable-laser (488-1100 nm) Horiba Jovin Yovan T64000 Triple Monochrometer Raman spectrometer, equipped with Confocal Microscope and laser-steering options, a FEI Strata 400S Focused Ion Beam/SEM/STEM facility equipped with ion or electron beam assisted deposition of platinum for sample microthinning, device inspection, circuit isolation and formation of interconnects.